发明名称 半導体装置およびその製造方法
摘要 A plurality of semiconductor devices provided on a silicon carbide substrate are provided with electrode layers, respectively. The silicon carbide substrate is cut at a region of an exposed surface of the silicon carbide substrate that separates the electrode layers to individually separate the semiconductor devices. A stress relaxation resin is applied to each individually separated semiconductor device to cover the exposed surface at a peripheral end portion of that surface of the semiconductor device which has the electrode layer thereon. A semiconductor apparatus can thus be obtained that also allows a semiconductor device with a silicon carbide or similar compound semiconductor substrate to adhere to a sealant resin via large adhesive strength and thus allows the sealant resin to be less crackable, less peelable and the like by thermal stress caused in operation.
申请公布号 JP5804203(B2) 申请公布日期 2015.11.04
申请号 JP20140524495 申请日期 2012.07.11
申请人 三菱電機株式会社 发明人 寺井 護;井高 志織;山本 圭;中木 義幸
分类号 H01L23/29;H01L21/301;H01L21/60;H01L23/31 主分类号 H01L23/29
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