| 摘要 |
<p>To provide a negative photosensitive resin composition which is excellent in storage stability of silanol groups and which is applicable to preparation of partition walls which can maintain excellent ink repellency even after ink affinity-imparting treatment, and partition walls for an optical device using such a composition. A negative photosensitive resin composition comprising an ink repellent (A) made of a fluorosiloxane compound having a hydroxy group bonded to a silicon atom and containing fluorine atoms in a proportion of from 10 to 55 mass % based on the total amount of the compound, a photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, a photopolymerization initiator (C) and a solvent (D), wherein the proportion of the ink repellent (A) is from 0.01 to 10 mass % based on the total solid content of the composition, and the proportion of the hydroxy groups bonded to a silicon atom derived from the ink repellent (A) is from 0.000001 to 1.0 mmol/g based on the total amount of the composition.</p> |
