发明名称 METHOD OF GROWING NITRIDE SEMICONDUCTOR AND LIGHT EMITTING DEVICE FABRICATED BY USING THE SAME
摘要 Disclosed are a method for growing a nitride semiconductor and a light emitting device manufactured thereby. The light emitting device according to the present invention includes an n-type nitride semiconductor layer which includes an intermediate layer, an active layer which is located on the n-type nitride semiconductor layer, and a p-type nitride semiconductor layer which is located on the active layer. The intermediate layer includes a super lattice layer which is formed by repetitively stacking a first nitride layer and a second nitride layer with bandgap energy which is smaller than the bandgap energy of the first nitride layer. The first nitride layer is doped with an n-type of doping density over 5 x 1019atoms/cm^3.
申请公布号 KR20150123538(A) 申请公布日期 2015.11.04
申请号 KR20140050041 申请日期 2014.04.25
申请人 SEOUL VIOSYS CO., LTD. 发明人 JUNG, JUNG WHAN;KIM, KYUNG HAE
分类号 H01L33/14;H01L33/32 主分类号 H01L33/14
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