发明名称 |
METHOD OF GROWING NITRIDE SEMICONDUCTOR AND LIGHT EMITTING DEVICE FABRICATED BY USING THE SAME |
摘要 |
Disclosed are a method for growing a nitride semiconductor and a light emitting device manufactured thereby. The light emitting device according to the present invention includes an n-type nitride semiconductor layer which includes an intermediate layer, an active layer which is located on the n-type nitride semiconductor layer, and a p-type nitride semiconductor layer which is located on the active layer. The intermediate layer includes a super lattice layer which is formed by repetitively stacking a first nitride layer and a second nitride layer with bandgap energy which is smaller than the bandgap energy of the first nitride layer. The first nitride layer is doped with an n-type of doping density over 5 x 1019atoms/cm^3. |
申请公布号 |
KR20150123538(A) |
申请公布日期 |
2015.11.04 |
申请号 |
KR20140050041 |
申请日期 |
2014.04.25 |
申请人 |
SEOUL VIOSYS CO., LTD. |
发明人 |
JUNG, JUNG WHAN;KIM, KYUNG HAE |
分类号 |
H01L33/14;H01L33/32 |
主分类号 |
H01L33/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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