| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask for forming a high-definition thin film pattern and capable of suppressing damage caused by impurities to the thin film pattern. <P>SOLUTION: A mask 1 which contacts and installed to a substrate is provided for forming multiple types of thin film patterns in certain forms. The mask 1 comprises: a resin film 2 which transmits visible light; and a holding member 3 for holding the resin film 2, which is formed by a plate body with a through-opening 5 having a shape larger than one thin film pattern corresponding to a formed region of the one thin film pattern among formed regions of the multiple types of thin film patterns predefined on the substrate. The film 2 includes an opening pattern 4 having the same shape as the one thin film pattern in the opening 5 of the holding member 3 corresponding to the formed region of the one thin film pattern on the substrate, and has a recess 6 having the same shape as other thin film pattern on a contact surface side of the substrate corresponding to a formed region of the other thin film pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
