| 摘要 |
According to one embodiment of the present invention, the alignment of an upper substrate and a lower substrate is precisely and easily inspected and measured. For this, one embodiment of the present invention includes an apparatus for measuring the upper and lower alignment of the substrates, capable of calculating a numerical alignment value through the coordinates movement of a measurement stage with a linear scale and generating and determining an image based on an alignment matching rate with upper and lower optical devices for inspecting and measuring the upper and lower alignment of the upper substrate and the lower substrate which are vertically stacked on the measurement stage to perform the coordinates plane driving of the linear scale. |
