| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which sufficiently satisfies sensitivity, and is excellent in EL, DOF, CDU, and MEEF.SOLUTION: The radiation sensitive resin composition forms a resist pattern using a developer containing 80 mass% or more of an organic solvent. The radiation sensitive resin composition includes (A) a polymer containing an acid-dissociable group, and (B) a radiation-sensitive acid generator. When development is conducted with the organic solvent, a contrast value γ calculated from a resist sensitivity curve is 5.0 or more and 30.0 or less. The organic solvent is effectively at least a kind of organic solvent selected from the group consisting of 3-7C carboxylic acid alkyl ester and 3-10C dialkyl ketone. |
