发明名称 |
ALUMINUM COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM |
摘要 |
The invention provides an aluminum compound of general formula (I) and a thin film forming material containing the aluminum compound. In formula (I), R 1 and R 2 each represent straight or branched C2-C5 alkyl, and R 3 represent methyl or ethyl. R 1 and R 2 are each preferably ethyl. The compound has a low melting temperature, sufficient volatility, and high thermal stability and is therefore suited for use as a material for thin film formation by CVD. |
申请公布号 |
EP2940025(A1) |
申请公布日期 |
2015.11.04 |
申请号 |
EP20130869190 |
申请日期 |
2013.11.26 |
申请人 |
ADEKA CORPORATION |
发明人 |
YOSHINO, TOMOHARU;SAKURAI, ATSUSHI;SHIRATORI, TSUBASA;HATASE, MASAKO;UCHIUZOU, HIROYUKI;NISHIDA, AKIHIRO |
分类号 |
C07F5/06;C23C16/40;H01L21/316 |
主分类号 |
C07F5/06 |
代理机构 |
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代理人 |
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地址 |
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