发明名称 |
Method of forming a memory device |
摘要 |
A front-end method of fabricating nickel plated caps over copper bond pads used in a memory device. The method provides protection of the bond pads from an oxidizing atmosphere without exposing sensitive structures in the memory device to the copper during fabrication. |
申请公布号 |
US9177927(B2) |
申请公布日期 |
2015.11.03 |
申请号 |
US201414534668 |
申请日期 |
2014.11.06 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
Moore John;Brooks Joseph F. |
分类号 |
H01L21/336;H01L23/00;H01L27/24;H01L45/00 |
主分类号 |
H01L21/336 |
代理机构 |
Dickstein Shapiro LLP |
代理人 |
Dickstein Shapiro LLP |
主权项 |
1. A method of forming a memory element, comprising the acts of:
forming circuitry in a memory array; forming a plurality of insulating portions over the circuitry; forming an electrical connection through said plurality of insulating portions to said circuitry, wherein at least one of the electrical connections comprises a via filled with tungsten; etching at least one of said insulating portions to form an etched region; forming a bond pad in the etched region; plating the bond pad to form a cap over the bond pad; forming memory material over the plurality of insulating portions; and forming an electrode over the memory material. |
地址 |
Boise ID US |