发明名称 Method of forming a memory device
摘要 A front-end method of fabricating nickel plated caps over copper bond pads used in a memory device. The method provides protection of the bond pads from an oxidizing atmosphere without exposing sensitive structures in the memory device to the copper during fabrication.
申请公布号 US9177927(B2) 申请公布日期 2015.11.03
申请号 US201414534668 申请日期 2014.11.06
申请人 MICRON TECHNOLOGY, INC. 发明人 Moore John;Brooks Joseph F.
分类号 H01L21/336;H01L23/00;H01L27/24;H01L45/00 主分类号 H01L21/336
代理机构 Dickstein Shapiro LLP 代理人 Dickstein Shapiro LLP
主权项 1. A method of forming a memory element, comprising the acts of: forming circuitry in a memory array; forming a plurality of insulating portions over the circuitry; forming an electrical connection through said plurality of insulating portions to said circuitry, wherein at least one of the electrical connections comprises a via filled with tungsten; etching at least one of said insulating portions to form an etched region; forming a bond pad in the etched region; plating the bond pad to form a cap over the bond pad; forming memory material over the plurality of insulating portions; and forming an electrode over the memory material.
地址 Boise ID US