发明名称 PROCESS FOR PRODUCING MAGNETORESISTIVE ELEMENT
摘要 The present invention provides a method for manufacturing a magnetoresistive element with a high selection ratio of an insulating layer to a free layer. The method for manufacturing the magnetoresistive element includes the steps of preparing (left drawing and middle drawing) a substrate (201) on which the free layer (206), a fixed layer (204) arranged on the lower side of a first magnetic layer, and a barrier layer which is an insulating layer and is arranged between the free layer (206) and the fixed layer (204) are formed; and processing (right drawing) the free layer (206) by plasma etching. The insulating layer (702) comprising the barrier layer contains a Ta element or a Ti element.
申请公布号 KR20150123211(A) 申请公布日期 2015.11.03
申请号 KR20150144559 申请日期 2015.10.16
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SATAKE MAKOTO;HAYAKAWA JUN;TETSUKA TSUTOMU;SHIMADA TAKESHI;YAMAMOTO NAOHIRO;YOSHIDA ATSUSHI
分类号 H01L43/08;B44C1/22;C23C16/30;C30B29/40;G11C11/15 主分类号 H01L43/08
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