发明名称 |
PROCESS FOR PRODUCING MAGNETORESISTIVE ELEMENT |
摘要 |
The present invention provides a method for manufacturing a magnetoresistive element with a high selection ratio of an insulating layer to a free layer. The method for manufacturing the magnetoresistive element includes the steps of preparing (left drawing and middle drawing) a substrate (201) on which the free layer (206), a fixed layer (204) arranged on the lower side of a first magnetic layer, and a barrier layer which is an insulating layer and is arranged between the free layer (206) and the fixed layer (204) are formed; and processing (right drawing) the free layer (206) by plasma etching. The insulating layer (702) comprising the barrier layer contains a Ta element or a Ti element. |
申请公布号 |
KR20150123211(A) |
申请公布日期 |
2015.11.03 |
申请号 |
KR20150144559 |
申请日期 |
2015.10.16 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
SATAKE MAKOTO;HAYAKAWA JUN;TETSUKA TSUTOMU;SHIMADA TAKESHI;YAMAMOTO NAOHIRO;YOSHIDA ATSUSHI |
分类号 |
H01L43/08;B44C1/22;C23C16/30;C30B29/40;G11C11/15 |
主分类号 |
H01L43/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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