| 摘要 |
The present invention relates to a liquefied gas vaporizer which vaporizes liquefied gas to be supplied to a chamber of a substrate processing device. The liquefied gas vaporizer which vaporizes liquefied gas comprises: a body unit which has an inner space to form a gas flow passage through which the liquefied gas flows; a liquefied gas supply unit which supplies the liquefied gas to the body unit; a heating unit which includes one or more inner heaters provided at a center portion of the body unit and one or more outer heaters provided at an outer portion of the body unit, to provide heat to the liquefied gas supplied from the liquefied supply unit; and a gas discharge unit which discharges gas vaporized by the heating unit. Accordingly, it is possible to vaporize low-temperature liquefied gas by rapidly heating, and to increase vaporization efficiency of liquefied gas by broadening the heat exchange area of the liquefied gas. It is possible to prevent a hole from becoming clogged by forming a gas flow passage in a spiral shape, and to easily clean the vaporizer. |
