发明名称 |
Low-resistance electrode design |
摘要 |
A solution for designing a semiconductor device, in which two or more attributes of a pair of electrodes are determined to, for example, minimize resistance between the electrodes, is provided. Each electrode can include a current feeding contact from which multiple fingers extend, which are interdigitated with the fingers of the other electrode in an alternating pattern. The attributes can include a target depth of each finger, a target effective width of each pair of adjacent fingers, and/or one or more target attributes of the current feeding contacts. Subsequently, the device and/or a circuit including the device can be fabricated. |
申请公布号 |
US9178025(B2) |
申请公布日期 |
2015.11.03 |
申请号 |
US201414499652 |
申请日期 |
2014.09.29 |
申请人 |
Sensor Electronic Technology, Inc. |
发明人 |
Simin Grigory;Shur Michael;Gaska Remigijus |
分类号 |
H01L29/66;H01L29/417;G06F17/50;H01L23/482;H01L23/64 |
主分类号 |
H01L29/66 |
代理机构 |
LaBatt, LLC |
代理人 |
LaBatt, LLC |
主权项 |
1. A semiconductor device comprising:
a first electrode and a second electrode to a semiconductor structure of the device, wherein each electrode includes a current feeding contact and a plurality of fingers extending therefrom, and wherein the plurality of fingers of the first and second electrodes are adjacent to each other in an alternating pattern, and wherein a depth, dFING, for each end finger satisfies dFING≧3*LTR, and a depth for each and every interior finger satisfies dFING≧6*LTR, where LTR is a characteristic contact transfer length for a junction between the fingers and the semiconductor device. |
地址 |
Columbia SC US |