| 摘要 |
The present invention relates to a two-way type apparatus for processing a light guide plate, wherein a single rotating belt is connected to a cross bar moving over a basic frame and one or more pattern forming units are selectively connected to the rotating belt so that a different pattern forming unit can be disposed and used according to an area of a light guide plate. An air damper is used to reduce an impact of a pattern forming unit on a light guide plate and the height of a cutter is adjustable to allow processing of light guide plates having various areas. According to the two-way type apparatus for processing a light guide plate, multiple pattern forming units can be used by using a rotating process of a single rotating belt to simultaneously perform multiple pattern formation regardless of size of a light guide plate, thereby improving working speed. |
