| 摘要 |
The present invention provides a method for manufacturing a silicon substrate having texture structure, by which, in comparison with conventional methods, it is possible to reduce manufacturing step and form easily regular texture structure on silicon substrate surface. The method of the present invention comprises the steps of: (A) forming a pattern on the silicon substrate using a resin-comprising composition; (B) irradiating an etching gas to the silicon substrate surface other than the pattern portion; and (C) processing the silicon substrate irradiated with the etching gas with an alkaline etching fluid to form concave structure under the pattern portion. Furthermore, the present invention provides a resin-comprising composition usable in the method, in particular, a composition comprising photo-curable resin. |
| 主权项 |
1. A method for manufacturing a silicon substrate having texture structure, said method comprising steps of:
(A) forming a pattern with a resin-comprising composition on the silicon substrate, (B) irradiating an etching gas to the silicon substrate surface other than the pattern portion, and (C) processing the silicon substrate irradiated with the etching gas with an alkaline etching liquid to form concave structure under the pattern portion, wherein said resin-comprising composition comprises:
(a) polymerizable monomer having (meth)acrylic group,(b) photoinitiator, and(c) hydrolysate of akloxysilane, wherein said hydrolysate of alkoxysilane is at least one selected from a group consisting of:
hydrolysate of a mixture of general alkoxysilane having a general formula (2): (wherein (R5)s are, same or different, C1-4 alkyl group; n is an integer of 1-10) and (meth)acrylic group-containing alkoxysilane having a general formula (3): (wherein R6 is hydrogen atom or methyl; R7 is C1-10 alkylene, C3-10 cycloalkylene or C3-10 polymethylene; R8 is C1-4 alkyl, C3-4 cycloalkyl or C6-12 aryl; R9 is C1-4 alkyl or C3-4 cycloalkyl; l is an integer of 1-3, m is an integer of 0-2, k is an integer of 1-3 and (l+m+k) is 4; in case that respective R6, R7, R8 or R9 is present in plural, each of R6(s), R7(s), R8(s) or R9(s) may be same to or different from each other);hydrolysate of the (meth)acrylic group-containing alkoxysilane of the general formula (3); andhydrolysate of a mixture of the general alcoxysilane of the general formula (2), the (meth)acrylic group-containing alkoxysilane of the general formula (3) and metal alkoxide having a general formula (6):
M-(OR13)4 (6)(wherein M is zirconium or titanium; and (R13)s are, same or different, C1-10 alkyl group). |
