发明名称 WATER TREATMENT APPARATUS OF CHLORINE-UV COMBINED OXIDATION FOR REMOVING ALGAE-CAUSED NOXIOUS SUBSTANCE, AND VARIABLE CONTROL METHOD OF CHLORINE DOSAGE AND UV DOSE USING THE SAME
摘要 Disclosed is a water treatment apparatus of chlorine-UV combined oxidation for removing algae-caused noxious substance and a method for variably controlling chlorine dosage and UV intensity using the same. The water treatment apparatus does not use an oxidizing agent such as existing ozone, hydrogen peroxide, etc. by inserting chlorine into a front end of a duct type UV reactor in a predetermined pH condition to remove noxious substances such as algae-caused off-flavor induction substances induced by the occurrence of green algae in a river, algae toxicity substances, medical substances, etc. A follow-up adsorption process such as activated carbon is not needed. In addition, the injection position and injection amount of the chlorine are selectively controlled according to the water quality property of inflow water. An operating convenience is provided by controlling a feedback along with the UV intensity and the chlorine dosage determined by value analysis according to the kind and concentration of the algae-caused noxious substance in the apparatus of chlorine-UV combined oxidation when the algae-caused noxious substance is introduced. Power consumption amounts and medicine usage amounts are reduced. The mis-injection of the medicine can be prevented in advance.
申请公布号 KR20150122876(A) 申请公布日期 2015.11.03
申请号 KR20140048809 申请日期 2014.04.23
申请人 KOREA INSTITUTE OF CONSTRUCTION TECHNOLOGY 发明人 HWANG, TAE MUN;KANG, JOON WUN;YOON, YEO JOON;KWON, MIN HWAN
分类号 C02F1/72;C02F1/32;C02F1/50;G01N33/18;G05D11/08 主分类号 C02F1/72
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