SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

The present invention is to obtain a substrate processing device and a substrate processing method for effectively suppressing a voltage change of a substrate on an electrode and suppressing a change of incident energy of ions received by the substrate. To this end, the substrate processing device comprises: a first electrode for maintaining the substrate in a main circumference; a second electrode facing the first electrode; and a pulse power supply unit for supplying RF power and a pulse voltage to the first electrode wherein the RF power applies an RF voltage having 40MHz frequency or more to the first electrode and the pulse voltage lowers a voltage in response to the elapse of time and has an overlap with the RF voltage.