发明名称 |
Magnetic disk and manufacturing method thereof |
摘要 |
A magnetic disk having at least a magnetic layer, a carbon protective layer, and a lubrication layer sequentially provided on a substrate. The lubrication layer is a film formed by a lubricant that contains two types of compounds having a perfluoropolyether main chain in the structure, a molecular weight distribution of the two types in total being within a range of 1 to 1.2. The two types of compounds include a compound a having a hydroxyl group at the end and a compound b having a number average molecular weight smaller than the number average molecular weight of the compound a and not more than 1500. A content of the compound b in the two types of compounds is not more than 10%. |
申请公布号 |
US9177586(B2) |
申请公布日期 |
2015.11.03 |
申请号 |
US200913121901 |
申请日期 |
2009.09.30 |
申请人 |
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发明人 |
Shimokawa Koichi;Hamakubo Katsushi;Itoh Kae |
分类号 |
G11B5/65;G11B5/84;G11B5/86;C10M107/38;C10M171/02;C10M177/00;G11B5/725 |
主分类号 |
G11B5/65 |
代理机构 |
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代理人 |
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主权项 |
1. A magnetic disk comprising:
a substrate; at least a magnetic layer, a protective layer, and a lubrication layer sequentially provided on the substrate, wherein the lubrication layer is a film formed by a lubricant that contains two types of compounds each having a perfluoropolyether main chain in its structure, wherein the two types of compounds includes a compound a having two or four hydroxyl groups in total at ends of a molecule of the compound a and a compound b, and wherein the compound b has a number average molecular weight that is smaller than the number average molecular weight of the compound a and not more than 1500; wherein a molecular weight distribution of the two types of compounds in total is within a range of 1 to 1.2; wherein a content of the compound b in the two types of compounds is not more than 10%; and wherein the compound b is selected from the group consisting of the following compounds represented by formula (1), formula (2), formula (3) and formula (4): wherein Rf represents —(OC2F4)m(OCF2)n- and m and n each represents an integer of not less than 1. |
地址 |
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