发明名称 Semiconductor light emitting device
摘要 According to one embodiment, a semiconductor light emitting device includes an electrode layer, a first semiconductor layer, a first elongated electrode, a second semiconductor layer, and a light emitting layer. The first semiconductor layer includes a crystal having a cleavage plane. The first semiconductor layer includes a first thin film portion and a thick film portion. The first thin film portion extends in a first direction perpendicular to a stacking direction from the electrode layer toward the first semiconductor layer. The first thin film portion has a first thickness. The thick film portion is arranged with the first thin film portion in a plane perpendicular to the stacking direction. An angle between the first direction and the cleavage plane is not less than 3 degrees and not more than 27 degrees. The first elongated electrode extends in the first direction in contact with the first thin film portion.
申请公布号 US9178111(B2) 申请公布日期 2015.11.03
申请号 US201314083927 申请日期 2013.11.19
申请人 Kabushiki Kaisha Toshiba 发明人 Tajima Jumpei;Zaima Kotaro;Hikosaka Toshiki;Ono Hiroshi;Sugiyama Naoharu;Nunoue Shinya
分类号 H01L33/00;H01L27/14;H01L31/0232;H01L23/48;H01L23/52;H01L29/40;H01L33/18;H01L29/04;H01L33/36;H01L51/44;H01L33/38;H01L33/16;H01L21/02;H01L31/036;H01L33/20;H01L31/0224;H01L33/22;H01L33/32 主分类号 H01L33/00
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A semiconductor light emitting device, comprising: an electrode layer; a first semiconductor layer of a first conductivity type including a crystal having a cleavage plane, the first semiconductor layer including a first thin film portion extending in a first direction perpendicular to a third direction from the electrode layer toward the first semiconductor layer, the first thin film portion having a first thickness, and a thick film portion arranged with the first thin film portion in a plane perpendicular to the third direction, the thick film portion having a second thickness thicker than the first thickness, and an angle between the first direction and the cleavage plane being not less than 3 degrees and not more than 27 degrees; a first elongated electrode extending in the first direction in contact with the first thin film portion; a second semiconductor layer of a second conductivity type provided between the electrode layer and the first semiconductor layer and electrically connected to the electrode layer; and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer.
地址 Minato-ku JP