发明名称 |
Light-emitting device and method for manufacturing same |
摘要 |
The present invention relates to a light-emitting device that is capable of preventing an increase in forward voltage while improving optical output characteristics, and to a method for manufacturing same. The light-emitting device comprises: a first conductive semiconductor layer; an active layer which is in contact with the first conductive semiconductor layer; a second conductive semiconductor layer which is in contact with the active layer and which has a patterned groove on a surface opposite the surface that is in contact with the active layer; a current-blocking layer which is formed on a bottom of the groove; a transparent conductive layer which is formed along a surface opposite the surface of the second conductive semiconductor layer that is in contact with the active layer, a sidewall of the groove, and the current-blocking layer; a reflective layer which is formed on a surface opposite the surface of the transparent conductive layer that is in contact with the second conductive semiconductor layer; a support substrate which is formed on a surface opposite the surface of the reflective layer that is in contact with the transparent conductive layer; and an electrode that is patterned on a surface opposite the surface of the first conductive semiconductor layer that is in contact with the active layer. |
申请公布号 |
US9178110(B2) |
申请公布日期 |
2015.11.03 |
申请号 |
US201314384520 |
申请日期 |
2013.01.10 |
申请人 |
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
Kim Tae geun;Kim Su-jin |
分类号 |
H01L33/14;H01L33/38;H01L33/42;H01L33/60;H01L33/00;H01L33/20;H01L33/40;H01L33/44 |
主分类号 |
H01L33/14 |
代理机构 |
Kile Park Reed & Houtteman PLLC |
代理人 |
Kile Park Reed & Houtteman PLLC |
主权项 |
1. A light-emitting device, comprising:
a first conductive semiconductor layer; an active layer which is in contact with the first conductive semiconductor layer; a second conductive semiconductor layer which is in contact with the active layer, and which has a patterned groove on one surface thereof opposite to another surface thereof that is in contact with the active layer; a current-blocking layer which is formed only on a bottom surface of the groove excluding a sidewall of the groove; a transparent conductive layer which is formed along one surface of the second conductive semiconductor layer opposite to another surface thereof that is in contact with the active layer, a sidewall of the groove, and the current-blocking layer; a reflective layer which is formed on one surface of the transparent conductive layer opposite to another surface thereof that is in contact with the second conductive semiconductor layer; a support substrate which is formed on one surface of the reflective layer opposite to another surface thereof that is in contact with the transparent conductive layer; and an electrode that is patterned on one surface of the first conductive semiconductor layer opposite to another surface thereof that is in contact with the active layer. |
地址 |
Seoul KR |