发明名称 Apparatus and method for forming chalcogenide semiconductor absorber materials with sodium impurities
摘要 A method and system for forming chalcogenide semiconductor absorber materials with sodium impurities is provided. The system includes a sodium vaporizer in which a solid sodium source material is vaporized. The sodium vapor is added to reactant gases and/or annealing gases and directed to a furnace that includes a substrate with a metal precursor material. The precursor material reacts with reactant gases such as S-containing gases and Se-containing gases according to various process sequences. In one embodiment, a selenization operation is followed by an annealing operation and a sulfurization operation and the sodium vapor is caused to react with the metal precursor during at least one of the annealing and the sulfurization steps to produce a chalcogenide semiconductor absorber material that includes sodium dopant impurities.
申请公布号 US9178103(B2) 申请公布日期 2015.11.03
申请号 US201313962979 申请日期 2013.08.09
申请人 TSMC Solar Ltd. 发明人 Wu Chung-Hsien;Yen Wen-Tsai;Wu Jyh-Lih
分类号 H01L31/0392;H01L31/18;C23C12/00 主分类号 H01L31/0392
代理机构 Duane Morris LLP 代理人 Duane Morris LLP
主权项 1. A method for forming a chalcogenide semiconductor absorber material, said method comprising: disposing a substrate with metallic precursors thereon, in a furnace; vaporizing sodium to produce a sodium vapor; selenizing by causing thermal reaction between selenium and said metallic precursors in a selenization reaction in said furnace; sulfurizing by causing thermal reaction between sulfur and said metallic precursors in a sulfurization reaction in said furnace after said selenization reaction; and annealing after said selenization reaction, wherein at least one of said sulfurizing and said annealing includes causing said sodium vapor to react with said metallic precursors.
地址 Taichung TW