发明名称 Wafer-level light emitting diode structure, light emitting diode chip, and method for forming the same
摘要 A method for fabricating a wafer-level light emitting diode structure is provided. The method includes: providing a substrate, wherein a first semiconductor layer, a light emitting layer, and a second semiconductor layer are sequentially disposed on the substrate; subjecting the first semiconductor layer, the light emitting layer, and the second semiconductor layer with a patterning process to form a first depressed portion, a second depressed portion, a stacked structure disposed on the second depressed portion and a remained first semiconductor layer disposed on the depressed portion, wherein the stacked structure comprises a patterned second semiconductor layer, a patterned emitting layer, and a patterned first semiconductor layer; forming a first electrode on the remained first semiconductor layer of the first depressed portion; and forming a second electrode correspondingly disposed on the patterned second semiconductor layer of the second depressed portion.
申请公布号 US9178107(B2) 申请公布日期 2015.11.03
申请号 US201113197677 申请日期 2011.08.03
申请人 Industrial Technology Research Institute 发明人 Tsai Yao-Jun;Hsu Chen-Peng;Lin Kuo-Feng;Liu Hsun-Chih;Hu Hung-Lieh;Sun Chien-Jen
分类号 H01L33/00;H01L33/20;H01L33/44 主分类号 H01L33/00
代理机构 代理人
主权项 1. A method for fabricating a wafer-level light emitting diode structure, comprising: providing a growth substrate, wherein a first semiconductor layer, a light emitting layer, and a second semiconductor layer are sequentially disposed on the substrate; subjecting the first semiconductor layer, the light emitting layer, and the second semiconductor layer with a patterning process to form a plurality of first portions and a plurality of second portions, wherein each of the plurality of second portions has a stacked structure and each of the plurality of first portions has an extended portion of the first semiconductor layer, wherein the plurality of first portions overlap with predetermined cutting ranges; forming an first electrode on the extended portion of the first semiconductor layer in each of the plurality of first portions; forming a second electrode on the stacked structure in each of the plurality of second portions; measuring a current-voltage characteristic of the wafer-level light emitting diode structure via the first electrode and the second electrode; and cutting the growth substrate along the predetermined cutting ranges, thus removing each first electrode and obtaining a plurality of light emitting diode chips.
地址 Hsinchu TW