发明名称 |
Wafer-level light emitting diode structure, light emitting diode chip, and method for forming the same |
摘要 |
A method for fabricating a wafer-level light emitting diode structure is provided. The method includes: providing a substrate, wherein a first semiconductor layer, a light emitting layer, and a second semiconductor layer are sequentially disposed on the substrate; subjecting the first semiconductor layer, the light emitting layer, and the second semiconductor layer with a patterning process to form a first depressed portion, a second depressed portion, a stacked structure disposed on the second depressed portion and a remained first semiconductor layer disposed on the depressed portion, wherein the stacked structure comprises a patterned second semiconductor layer, a patterned emitting layer, and a patterned first semiconductor layer; forming a first electrode on the remained first semiconductor layer of the first depressed portion; and forming a second electrode correspondingly disposed on the patterned second semiconductor layer of the second depressed portion. |
申请公布号 |
US9178107(B2) |
申请公布日期 |
2015.11.03 |
申请号 |
US201113197677 |
申请日期 |
2011.08.03 |
申请人 |
Industrial Technology Research Institute |
发明人 |
Tsai Yao-Jun;Hsu Chen-Peng;Lin Kuo-Feng;Liu Hsun-Chih;Hu Hung-Lieh;Sun Chien-Jen |
分类号 |
H01L33/00;H01L33/20;H01L33/44 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating a wafer-level light emitting diode structure, comprising:
providing a growth substrate, wherein a first semiconductor layer, a light emitting layer, and a second semiconductor layer are sequentially disposed on the substrate; subjecting the first semiconductor layer, the light emitting layer, and the second semiconductor layer with a patterning process to form a plurality of first portions and a plurality of second portions, wherein each of the plurality of second portions has a stacked structure and each of the plurality of first portions has an extended portion of the first semiconductor layer, wherein the plurality of first portions overlap with predetermined cutting ranges; forming an first electrode on the extended portion of the first semiconductor layer in each of the plurality of first portions; forming a second electrode on the stacked structure in each of the plurality of second portions; measuring a current-voltage characteristic of the wafer-level light emitting diode structure via the first electrode and the second electrode; and cutting the growth substrate along the predetermined cutting ranges, thus removing each first electrode and obtaining a plurality of light emitting diode chips. |
地址 |
Hsinchu TW |