PELLICLE STRUCTURE AND METHOD FOR FORMING THE SAME

摘要

Provided are a pellicle structure, a pellicle-mask structure, and a method for forming a pellicle structure. The pellicle structure includes a pellicle film formed with a carbon-based material. And, the pellicle film is formed to protect a mask structure in a lithography process. The pellicle-mask structure comprises a mask substrate having a mask pattern above; and a pellicle frame arranged on the mask substrate. The pellicle-mask structure also comprises a pellicle film arranged on the pellicle frame.