PATTERN FORMATION METHOD USING A DUAL TONE DEVELOPMENT PROCESS

摘要

A pattern forming method comprises the steps of: forming a dual tone photoresist layer on a support layer; exposing the dual tone photoresist layer by using a mask including a gray feature to form a low exposure area, an intermediate exposure area, and a high exposure area in a first area of the dual tone photoresist layer and to form a low exposure area, and an intermediate exposure area in a second area of the dual tone photoresist layer; removing the dual tone photoresist layer of the high exposure area of the first area through a positive development process to form multiple preliminary patterns in the first area; and removing a dual tone exposure layer of the low exposure area of the first area and the dual tone photoresist layer of the low exposure area of the second area through a negative development process to form multiple first patterns positioned separately in the first area and multiple second patterns positioned separately in the second area.