| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implantation device and an ion implantation method that can be used in a wide range.SOLUTION: A final energy filter 400 comprises an inlet side einzel lens 304, an intermediate electrode unit 401, and an outlet side einzel lens 308. The final energy filter 400 comprises an FEF power supply unit 414 configured to individually apply a voltage to the inlet side einzel lens 304, the intermediate electrode unit 401, and the outlet side einzel lens 308. The FEF power supply unit 414 applies a voltage to an upstream auxiliary electrode unit 402, a deflection electrode unit 306, and a downstream auxiliary electrode unit 404 respectively so that an energy range of an ion beam in a first region between the upstream auxiliary electrode unit 402 and the deflection electrode unit 306 and an energy range of an ion beam in a second region between the deflection electrode unit 306 and the downstream auxiliary electrode unit 404 are equivalent to each other. |
