SUBSTRATE TRANSFER DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning device and substrate cleaning method, capable of cleaning a lower surface of a substrate directed downward with a posture as it is without turning over the substrate.SOLUTION: A substrate cleaning device 11 for cleaning a substrate 15 to be transferred includes: a substrate transfer mechanism 12 for transferring the substrate 15 that is drawn by attracting one surface while maintaining a posture of the substrate 15 that is transferred in a state where the other surface is directed downward; and a cleaning mechanism 13 for cleaning one of the surfaces of the substrate 15 when the substrate 15 is transferred by the substrate transfer mechanism 12.