发明名称 |
TIN PLATING METHOD WHICH SUPPRESSES OXIDATION WITHOUT MIXING OF IMPURITY |
摘要 |
PROBLEM TO BE SOLVED: To provide a tin plating method which suppresses the change of the divalent first stannous ion to the tetra-valent second stannic ion and prevents contamination of a tin-based plating solution with impurities.SOLUTION: Tin plating is carried out while the concentration of dissolved oxygen in a room-temperature tin-based plating solution of a ratio (M/M) of the concentration M(g/L) of the second stannic ion to the concentration M(g/L) of the first stannous ion of 0.01 or lower is kept in 1 ppm or lower by adding metal tin grains to the tin-based plating solution as a deoxidizer in the atmosphere of ambient air. The average grain size of the metal tin grains is preferably 1-10 mm. When 1 liter of the tin-based plating solution contains A(g) of the first stannous ion, A×(0.01-0.05)(g) of metal tin grains are preferably added. |
申请公布号 |
JP2015190053(A) |
申请公布日期 |
2015.11.02 |
申请号 |
JP20140070787 |
申请日期 |
2014.03.31 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
HIRANO HIROTAKA;KATASE TAKUMA |
分类号 |
C25D3/30;C25D3/60 |
主分类号 |
C25D3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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