| 摘要 |
PROBLEM TO BE SOLVED: To keep a space for drying a substrate clean.SOLUTION: A substrate processing device 1 comprises a chamber main body 22 including an upper opening 222, a chamber lid part 23 including a lower opening 232, and a shield plate 51 arranged in a lid internal space 231 of the chamber lid part 23. Covering the upper opening 222 of the chamber main body 22 by the chamber lid part 23 forms a chamber 21. A substrate 9 is selectively arranged in a main body internal space 221 of the chamber main body 22 and in the lid internal space 231. When the substrate 9 is arranged in the main body internal space 221, a process liquid is supplied to an upper surface 91. When the substrate 9 is arranged in the lid internal space 231, dry processing by rotation of the substrate 9 is performed. In cleaning of the inside of the chamber lid part 23, a cleaning liquid is supplied to an upper surface 511 of the shield plate 51 rotating in the lid internal space 231, and dispersed to the internal surface of the chamber lid part 23 by centrifugal force. This keeps the lid internal space 231 for drying the substrate 9 clean. |
