发明名称 SPUTTERING TARGET FOR FORMING MAGNETIC RECORDING FILM AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target for forming a magnetic recording film, which is used for forming the magnetic recording film of FeNiPt, improves pass-through-flux (PTF) on a target surface, and allows stable sputtering.SOLUTION: A sputtering target for forming a magnetic recording film is a sintered body having a composition expressed by a composition formula: (FePt)Ni(30≤x≤80,1≤y≤20). The sintered body has a constitution in which a FePt phase and a NiPt phase are dispersed. Existence of the NiPt phase showing no ferromagnetism improves a PTF on a target surface.
申请公布号 JP2015190018(A) 申请公布日期 2015.11.02
申请号 JP20140068652 申请日期 2014.03.28
申请人 MITSUBISHI MATERIALS CORP 发明人 ISHIYAMA KOICHI;NONAKA SOHEI;MATSUZAKI HIDEHARU
分类号 C23C14/34;G11B5/851 主分类号 C23C14/34
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