FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, METHOD FOR GENERATING CONTROL SIGNAL, AND DEVICE FOR GENERATING CONTROL SIGNAL

摘要

PROBLEM TO BE SOLVED: To obtain a signal with high reliability, used to control the amount of introduction of a reactive gas by a plasma emission monitor method, at a high frequency.SOLUTION: A film deposition device includes: a measurement part which repeatedly measures a light emission spectrum of at least one of a material of a target and a reactive gas; a storage part which stores a first signal so acquired in advance as to include a waveform of periodic variation in light emission spectrum of a plasma on the basis of a measurement result based upon measurement in a first period; an acquisition part which repeats an acquisition process of acquiring a second signal including the waveform on the basis of a measurement result in a second period including the latest measurement point of time as an end point; a comparison operation part which generates a difference signal between signal parts whose waveforms correspond to each other between the first signal and the second signal; and an introduction amount control part which controls the amount of introduction of a reactive gas into the vacuum chamber on the basis of the difference signal. The acquisition part acquires the second signal each acquisition process on the basis of even the second signal acquired in a last acquisition process.