| 摘要 |
PROBLEM TO BE SOLVED: To efficiently dry a discharge part.SOLUTION: A substrate processing device 1 comprises a chamber main body 22 including an upper opening 222, a chamber lid part 23 including a lower opening 232, and a shield plate 51 arranged in a lid internal space 231 of the chamber lid part. Covering the upper opening of the chamber main body by the chamber lid part forms a chamber 21. A scan nozzle 186 which discharges a process liquid to a substrate 9 is arranged in the lid internal space as a discharge part. A head rotating mechanism 863 selectively arranges the discharge part in a discharge position above the lower opening and in a standby position radially separated with respect to the lower opening. In the lid internal space, an inert gas is supplied and an internal gas is discharged. When the process liquid is supplied to the substrate, the discharge part is arranged in the discharge position. When the discharge part is dried during the period during which the process liquid is not supplied to the substrate, the discharge part is arranged in a standby position, and the lower opening is blocked by the shield plate. Resultantly, the discharge part can be efficiently dried. |
