发明名称 |
Sensor system, substrate handling system and lithographic apparatus. |
摘要 |
A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle. |
申请公布号 |
NL2014374(A) |
申请公布日期 |
2015.11.02 |
申请号 |
NL20152014374 |
申请日期 |
2015.03.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JOERI LOF;JOOST KAUFFMAN;MARTIN DIETER NICO PETERS;PETRUS THEODORUS RUTGERS;MARTIJN HENDRIKUS WILHELMUS STOPEL;GERARD VAN DEN EIJKEL;HARMEN KLAAS VAN DER SCHOOT;RAIMOND VISSER |
分类号 |
G03F7/20;H01L21/68 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|