发明名称 |
ELECTROPLATING BATH ANALYSIS |
摘要 |
The present invention relates to an electroplating bath analysis for measuring an amount of an organic additive in a metal electroplating bath using electrochemical impedance spectroscopy. The present invention provides a method for measuring concentration of one or more organic components inside the metal electroplating bath, comprising the steps of: providing a device which has a rotatable working electrode and the counter electrode and the reference electrode and a potentiostat and a frequency response analyzer; obtaining a metal electroplating solution; washing the surface of the working electrode; balancing a convection current in the electroplating solution; overlaying alternating current potential perturbation; measuring an impedance response of the organic additive solution; selecting a frequency in the impedance response; and measuring the concentration of the organic additive by comparing the impedance response of the selected frequency with a calibration curve. |
申请公布号 |
KR20150122084(A) |
申请公布日期 |
2015.10.30 |
申请号 |
KR20150055797 |
申请日期 |
2015.04.21 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
THORSETH MATTHEW A. |
分类号 |
C25D21/12;C25D3/38;G01N27/411 |
主分类号 |
C25D21/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|