发明名称 ELECTROPLATING BATH ANALYSIS
摘要 The present invention relates to an electroplating bath analysis for measuring an amount of an organic additive in a metal electroplating bath using electrochemical impedance spectroscopy. The present invention provides a method for measuring concentration of one or more organic components inside the metal electroplating bath, comprising the steps of: providing a device which has a rotatable working electrode and the counter electrode and the reference electrode and a potentiostat and a frequency response analyzer; obtaining a metal electroplating solution; washing the surface of the working electrode; balancing a convection current in the electroplating solution; overlaying alternating current potential perturbation; measuring an impedance response of the organic additive solution; selecting a frequency in the impedance response; and measuring the concentration of the organic additive by comparing the impedance response of the selected frequency with a calibration curve.
申请公布号 KR20150122084(A) 申请公布日期 2015.10.30
申请号 KR20150055797 申请日期 2015.04.21
申请人 ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. 发明人 THORSETH MATTHEW A.
分类号 C25D21/12;C25D3/38;G01N27/411 主分类号 C25D21/12
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