| 摘要 |
The present invention discloses a photomask and a manufacturing method thereof, equipped with a light-transmitting conductor and a light shielding layer on a substrate. The light shielding layer comprises a light shielding material so as to prevent incident light from the outside to the substrate from penetrating into the substrate. The light shielding layer comprises a pattern corresponding to a nanostructure network formed by being arranged to intersect the nanostructure. |
