2 2 DIMENTIONAL PROCESS MONITORING APPARATUS,申请号KR20090099099-传众专利搜索

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发明名称	2 2 DIMENTIONAL PROCESS MONITORING APPARATUS
摘要	<p>본 발명은 2차원 공정 모니터링 장치를 제공한다. 이 장치는 탐침 기판, 탐침 기판의 일면에 이차원적으로 배열된 복수의 탐침 전극들, 탐침 기판을 관통하고 탐침 전극들과 연결되는 플러그들, 및 플러그들과 전기적으로 연결되고 탐침 기판의 타면에 배치된 내부 배선을 포함하고, 탐침 전극들은 플로팅되어, 탐침 전극들에 흐르는 전류는 변위 전류이다.</p>
申请公布号	KR101564787(B1)	申请公布日期	2015.10.30
申请号	KR20090099099	申请日期	2009.10.19
申请人		发明人
分类号	H01L21/205;H01L21/3065;H01L21/66	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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