| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography device which allows for smooth proceeding of drawing process, by performing data transfer to a deflection control circuit with no delay.SOLUTION: A lithography device 100 includes a plurality of control computer units 110 performing data conversion of drawing data in parallel for each of a plurality of processing regions obtained by virtually dividing the drawing area of a sample, a data transfer computer unit 120 for inputting the parts of the processing data of a processing region subjected to data conversion as n split processing data, and transferring the n split processing data, in order, so that the (n-1)th split processing data is transferred while inputting the n-th split processing data, a deflection control circuit 130 for controlling the deflection amount of a charged particle beam, along the split processing data transferred in order, and a drawing unit 150 for drawing a pattern on a sample, by deflecting a charged particle beam based on the amount of defection. |
