METHOD OF FABRICATING A CONDUCTIVE PATTERN WITH HIGH OPTICAL TRANSMISSION, LOW REFLECTANCE, AND LOW VISIBILITY

摘要

A method of fabricating a conductive pattern includes disposing an image of the conductive pattern on a substrate. The image includes material capable of being electroless plated. The image is electroless plated with a first metal forming a plated image. The first metal includes copper. The plated image is bathed in an immersion bath that includes a metal ion source of a second metal that reacts with the first metal. The second metal includes palladium. The conductive pattern includes a first metal layer having a first metal thickness, an intermetallic first metal-second metal interface layer, and a second metal layer having a second metal thickness.

主权项

1. A method of fabricating a conductive pattern comprising:
disposing an image of the conductive pattern on a substrate, wherein the image comprises material capable of being electroless plated; electroless plating the image with a first metal forming a plated image, wherein the first metal comprises copper; and bathing the plated image in an immersion bath comprising a metal ion source of a second metal that reacts with the first metal, wherein the second metal comprises palladium, wherein the conductive pattern comprises a first metal layer having a first metal thickness, an intermetallic first metal-second metal interface layer, and a second metal layer having a second metal thickness.