发明名称 SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME
摘要 A semiconductor device includes a single crystalline substrate, an electrical element and an optical element. The electrical element is disposed on the single crystalline substrate. The electrical element includes a gate electrode extending in a crystal orientation <110> and source and drain regions adjacent to the gate electrode. The source region and the drain region are arranged in a direction substantially perpendicular to a direction in which the gate electrode extends. The optical element is disposed on the single crystalline substrate. The optical element includes an optical waveguide extending in a crystal orientation <010>.
申请公布号 US2015309255(A1) 申请公布日期 2015.10.29
申请号 US201514796523 申请日期 2015.07.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM KI CHUL;KUH BONG JIN;WON JUNG YUN;LEE EUN HA;CHOI HAN MEI
分类号 G02B6/13;H01L29/66;G02B6/132 主分类号 G02B6/13
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor device, comprising: forming an optical element on a single crystalline substrate, the optical element comprising an optical waveguide extending in a crystal orientation <010>; and forming an electrical element comprising a gate electrode extending in a crystal orientation <110>, and source and drain regions adjacent to the gate electrode, the source and drain regions arranged in a direction substantially perpendicular to a direction in which the gate electrode extends.
地址 SUWON-SI KR