发明名称 |
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME |
摘要 |
A semiconductor device includes a single crystalline substrate, an electrical element and an optical element. The electrical element is disposed on the single crystalline substrate. The electrical element includes a gate electrode extending in a crystal orientation <110> and source and drain regions adjacent to the gate electrode. The source region and the drain region are arranged in a direction substantially perpendicular to a direction in which the gate electrode extends. The optical element is disposed on the single crystalline substrate. The optical element includes an optical waveguide extending in a crystal orientation <010>. |
申请公布号 |
US2015309255(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
US201514796523 |
申请日期 |
2015.07.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM KI CHUL;KUH BONG JIN;WON JUNG YUN;LEE EUN HA;CHOI HAN MEI |
分类号 |
G02B6/13;H01L29/66;G02B6/132 |
主分类号 |
G02B6/13 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a semiconductor device, comprising:
forming an optical element on a single crystalline substrate, the optical element comprising an optical waveguide extending in a crystal orientation <010>; and forming an electrical element comprising a gate electrode extending in a crystal orientation <110>, and source and drain regions adjacent to the gate electrode, the source and drain regions arranged in a direction substantially perpendicular to a direction in which the gate electrode extends. |
地址 |
SUWON-SI KR |