发明名称 EPITAXIAL WAFER AND SWITCH ELEMENT AND LIGHT-EMITTING ELEMENT USING SAME
摘要 An epitaxial wafer comprises an epitaxial layer disposed on a substrate. The epitaxial layer comprises first to third semiconductor layers. The third semiconductor layer has a thickness that is thicker than that of the first semiconductor layer. A second doping density of the second semiconductor layer is between a first doping density of the first semiconductor layer and a third doping density of the third semiconductor layer.
申请公布号 US2015311290(A1) 申请公布日期 2015.10.29
申请号 US201314648704 申请日期 2013.11.21
申请人 LG INNOTEK CO., LTD 发明人 KANG Seok Min;KIM Ji Hye;HWANG Min Young
分类号 H01L29/16;H01L33/00;H01L29/36;H01L33/26;H01L33/34;H01L33/22;H01L29/24;H01L29/872;H01L29/34 主分类号 H01L29/16
代理机构 代理人
主权项 1. An epitaxial wafer comprising: a substrate; and an epitaxial layer on the substrate, wherein the epitaxial layer comprises: a first semiconductor layer disposed on the substrate and having a first doping concentration; a second semiconductor layer disposed on the first semiconductor layer and having a second doping concentration; and a third semiconductor layer disposed on the second semiconductor layer, having a thickness thicker than a thickness of the first semiconductor layer, and having a third doping concentration, and wherein the second doping concentration is between the first doping concentration and the third doping concentration.
地址 Seoul KR