发明名称 |
EPITAXIAL WAFER AND SWITCH ELEMENT AND LIGHT-EMITTING ELEMENT USING SAME |
摘要 |
An epitaxial wafer comprises an epitaxial layer disposed on a substrate. The epitaxial layer comprises first to third semiconductor layers. The third semiconductor layer has a thickness that is thicker than that of the first semiconductor layer. A second doping density of the second semiconductor layer is between a first doping density of the first semiconductor layer and a third doping density of the third semiconductor layer. |
申请公布号 |
US2015311290(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
US201314648704 |
申请日期 |
2013.11.21 |
申请人 |
LG INNOTEK CO., LTD |
发明人 |
KANG Seok Min;KIM Ji Hye;HWANG Min Young |
分类号 |
H01L29/16;H01L33/00;H01L29/36;H01L33/26;H01L33/34;H01L33/22;H01L29/24;H01L29/872;H01L29/34 |
主分类号 |
H01L29/16 |
代理机构 |
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代理人 |
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主权项 |
1. An epitaxial wafer comprising:
a substrate; and an epitaxial layer on the substrate, wherein the epitaxial layer comprises: a first semiconductor layer disposed on the substrate and having a first doping concentration; a second semiconductor layer disposed on the first semiconductor layer and having a second doping concentration; and a third semiconductor layer disposed on the second semiconductor layer, having a thickness thicker than a thickness of the first semiconductor layer, and having a third doping concentration, and wherein the second doping concentration is between the first doping concentration and the third doping concentration. |
地址 |
Seoul KR |