发明名称 |
METHOD OF GROWING N-TYPE NITRIDE SEMICONDUCTOR, LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME |
摘要 |
A light emitting diode includes: an n-type nitride semiconductor layer; an active layer over the n-type nitride semiconductor layer; and a p-type nitride semiconductor layer over the active layer. The n-type nitride semiconductor layer includes: an n-type nitride layer; a first intermediate layer over the n-type nitride layer; an n-type modulation-doped layer over the first intermediate layer. The light emitting diodes includes a second intermediate layer over the n-type modulation-doped layer. The second intermediate layer includes a sub-layer having a higher n-type doping concentration that an n-type doping concentration of the n-type modulation-doped layer. |
申请公布号 |
US2015311382(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
US201514599300 |
申请日期 |
2015.01.16 |
申请人 |
Seoul Viosys Co., Ltd. |
发明人 |
Kim Kyung Hae;Jung Jung Whan |
分类号 |
H01L33/00;H01L33/06 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
1. A light emitting device comprising:
an n-type nitride semiconductor layer; an active layer disposed over the n-type nitride semiconductor layer; and a p-type nitride semiconductor layer disposed over the active layer, the n-type nitride semiconductor layer comprising:
an n-type nitride base layer;a first intermediate layer disposed over the n-type nitride base layer;an n-type modulation-doped layer disposed over the first intermediate layer; anda second intermediate layer disposed over the n-type modulation-doped layer; wherein the second intermediate layer includes a sub-layer having a higher n-type doping concentration than an n-type doping concentration of the n-type modulation-doped layer. |
地址 |
Ansan-si KR |