METHOD AND APPARATUS FOR OPTICAL PROXIMITY CORRECTION

摘要

Some embodiments of the present disclosure provide an integrated circuit (IC) design method. The method includes (1) receiving a first layout comprising stripe patterns with a first separation and a first width; (2) receiving a second layout comprising stripe patterns with a second width narrower than the first separation, each stripe on the second layout is configured to situate between two adjacent stripes on the first layout when overlaying the first layout and the second layout; (3) performing a separation check by identifying a spacing between a stripe on the second layout and one of the two adjacent stripes on the first layout; and (4) adjusting the spacing between the stripe on the second layout and one of the two adjacent stripes on the first layout when the separation check determining the spacing is greater than a predetermined value.

主权项

1. An integrated circuit (IC) design method, comprising:
receiving a first layout comprising stripe patterns with a first separation and a first width; receiving a second layout comprising stripe patterns with a second width narrower than the first separation, wherein each stripe of the stripe patterns on the second layout is configured to situate between two adjacent stripes of the stripe patterns on the first layout when overlaying the first layout and the second layout; performing a separation check by identifying a spacing between a stripe on the second layout and one of the two adjacent stripes on the first layout; and adjusting the spacing between the stripe on the second layout and one of the two adjacent stripes on the first layout when the separation check determining the spacing is greater than a predetermined value.