发明名称 Method for Producing an Antireflection Layer on a Silicone Surface and Optical Element
摘要 A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.
申请公布号 US2015309214(A1) 申请公布日期 2015.10.29
申请号 US201514693627 申请日期 2015.04.22
申请人 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. 发明人 Schulz Ulrike;Rickelt Friedrich;Munzert Peter;Kaiser Norbert
分类号 G02B1/111;G02B1/118;G02B1/12 主分类号 G02B1/111
代理机构 代理人
主权项 1. A method for producing an antireflection layer, the method comprising: forming an organic layer over a silicone surface; forming a reflection-reducing nanostructure in the organic layer using a plasma etching process; and forming a cover layer over the nanostructure.
地址 Munich DE