发明名称 |
Method for Producing an Antireflection Layer on a Silicone Surface and Optical Element |
摘要 |
A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method. |
申请公布号 |
US2015309214(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
US201514693627 |
申请日期 |
2015.04.22 |
申请人 |
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. |
发明人 |
Schulz Ulrike;Rickelt Friedrich;Munzert Peter;Kaiser Norbert |
分类号 |
G02B1/111;G02B1/118;G02B1/12 |
主分类号 |
G02B1/111 |
代理机构 |
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代理人 |
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主权项 |
1. A method for producing an antireflection layer, the method comprising:
forming an organic layer over a silicone surface; forming a reflection-reducing nanostructure in the organic layer using a plasma etching process; and forming a cover layer over the nanostructure. |
地址 |
Munich DE |