An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back- side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle at a first position and an illumination source to illuminate a first surface of the reticle at the first position. The inspection system further includes a first sensor to receive light from the illuminated first surface of the reticle when the reticle is at the first position and a second sensor to receive light from an illuminated second surface of the reticle when the reticle is at a second position.
申请公布号
WO2015161949(A1)
申请公布日期
2015.10.29
申请号
WO2015EP54578
申请日期
2015.03.05
申请人
ASML HOLDING N.V.
发明人
JANIK, STANLEY, G.;VLADIMIRSKY, YULI;WALSH, JAMES, H.