发明名称 ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
摘要 The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3);;where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C5 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
申请公布号 US2015309410(A1) 申请公布日期 2015.10.29
申请号 US201414295656 申请日期 2014.06.04
申请人 AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 RAHMAN M. Dalil;KUDO Takanori;DIOSES Alberto D.;MCKENZIE Douglas;ANYADIEGWU Clement;PADMANABAN Munirathna;MULLEN Salem K.
分类号 G03F7/09;G03F7/16;C09D165/00 主分类号 G03F7/09
代理机构 代理人
主权项 1. An antireflective coating composition comprising i) a crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3)where D is a direct valence bound or a C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic or naphthalenic moiety, R3 and R4 are independently hydrogen, C1-C8 alkyl or C1-C8 alkoxy; R5 and R6 are independently hydrogen C1-C8 alkyl or C1-C8 alkoxy; and, ii) a solvent.
地址 SOMERVILLE NJ US