发明名称 VOLUMETRIC SUBSTRATE SCANNER
摘要 A system for scanning a substrate and specifically a volume of that substrate to identify anomalous structures or defects is herein described. Radiation is focused at locations within the volume of the substrate and measurements of scattered light are made. Scanning of the volume of a substrate may be fairly uniform or over selected regions, favoring those regions of the substrate that are to be involved with subsequent substrate processing steps.
申请公布号 WO2015164325(A1) 申请公布日期 2015.10.29
申请号 WO2015US26801 申请日期 2015.04.21
申请人 RUDOLPH TECHNOLOGIES, INC. 发明人 WENZ, HOLGER
分类号 G01N21/95;G01B11/24;G01N21/47;H01L21/66 主分类号 G01N21/95
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