发明名称 |
COATING LIQUID FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR |
摘要 |
To provide a coating liquid for forming a metal oxide film, containing: an indium compound; at least one selected from the group consisting of a magnesium compound, a calcium compound, a strontium compound, and a barium compound; at least one selected from the group consisting of a compound containing a metal a maximum positive value of an oxidation number of which is IV, a compound containing a metal a maximum positive value of an oxidation number of which is V, and a compound containing a metal a maximum positive value of an oxidation number of which is VI; and an organic solvent. |
申请公布号 |
SG11201507942P(A) |
申请公布日期 |
2015.10.29 |
申请号 |
SG11201507942P |
申请日期 |
2014.03.26 |
申请人 |
RICOH COMPANY, LTD. |
发明人 |
NAKAMURA, YUKI;UEDA, NAOYUKI;MATSUMOTO, SHINJI;TAKADA, MIKIKO;SONE, YUJI;SAOTOME, RYOICHI;ARAE, SADANORI;ABE, YUKIKO |
分类号 |
H01L21/368;C09D1/00;H01L29/786 |
主分类号 |
H01L21/368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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