ANALYSIS SUPPORT METHOD AND ANALYSIS SUPPORT PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide an analysis support method and an analysis support program that can shorten the time for identifying a failure factor.SOLUTION: An analysis support device 100 derives a first feature value W1 based on an exposure simulation of a transfer pattern tp1 of a predetermined layer of each of plural first cells c1n under exposure of a predetermined exposure condition ec by using a layout pattern lp1 of a predetermined layer of the plural first cells c1n, and a second feature value W2 based on exposure simulation of a transfer pattern tp2 of a predetermined layer of each of plural second cells c2m under exposure of a predetermined exposure condition ec by using a layout pattern lp2 of a predetermined layer of the plural second cells c2m. The analysis support device 100 determines the presence or absence of a significant difference on the basis of an index value iv representing the significant difference between the first feature value derived for each of the plural first cells c1n and the second feature value W2 derived for each of the plural second cells c2m.