| 摘要 |
<p>PROBLEM TO BE SOLVED: To keep a substrate in a horizontal state when releasing the substrate, in a substrate processing apparatus whose substrate holding part rotates in a floating state.SOLUTION: A substrate rotation mechanism of a substrate processing apparatus is configured such that a rotor part 152 rotates in a floating state with respect to a stator part. An unchucking part comprises a first contact part 311, a first contact part moving mechanism 312, a second contact part, and a second contact part moving mechanism. When a substrate 9 is released, the first contact part moving mechanism 312 raises the first contact part 311 and pushes a movable chuck member 412 by bringing the first contact part 311 into contact with it, thereby changing the position of the movable chuck member 412 to an unchuck position. Meanwhile, the second contact part moving mechanism raises the second contact part and pushes a fixed chuck member by bringing the second contact part into contact with it, thereby keeping the substrate holding part and the substrate 9 in a horizontal state.</p> |
