| 发明名称 |
LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE |
| 摘要 |
The present invention provides a lithography apparatus that performs patterning on a substrate with a beam, the apparatus comprising a blanker configured to perform blanking of the beam, and a controller configured to control the blanker based on a quantized value of dose with respect to each of pixels on the substrate, wherein the controller is configured to determine the quantized value of dose with respect to each of the pixels based on an error between a target value of dose and each of a plurality of predicted values of dose that are based on a plurality of quantized values of dose. |
| 申请公布号 |
US2015311035(A1) |
申请公布日期 |
2015.10.29 |
| 申请号 |
US201514695391 |
申请日期 |
2015.04.24 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Norikane Hiro |
| 分类号 |
H01J37/302;H01J37/04;H01J37/317 |
主分类号 |
H01J37/302 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithography apparatus that performs patterning on a substrate with a beam, the apparatus comprising:
a blanker configured to perform blanking of the beam; and a controller configured to control the blanker based on a quantized value of dose with respect to each of pixels on the substrate, wherein the controller is configured to determine the quantized value of dose with respect to each of the pixels based on an error between a target value of dose and each of a plurality of predicted values of dose that are based on a plurality of quantized values of dose. |
| 地址 |
Tokyo JP |
