发明名称 |
ION ASSISTED DEPOSITION TOP COAT OF RARE-EARTH OXIDE |
摘要 |
A method of manufacturing an article comprises providing an article such as a chamber component for an etch reactor. A plasma spray deposition process is performed for deposit a first protective layer over at least one surface of the chamber component. The first protective layer is a plasma resistant ceramic having a thickness of greater than approximately 50 microns and a plurality of cracks and pores. An ion assisted deposition (IAD) process is then performed to deposit a second protective layer over the first protective layer. The second protective layer is a plasma resistant rare earth oxide having a thickness of less than 50 microns and a porosity of less than 1%. The second protective layer seals the plurality of cracks and pores of the first protective layer. |
申请公布号 |
WO2015164263(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
WO2015US26677 |
申请日期 |
2015.04.20 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SUN, JENNIFER Y.;KANUNGO, BIRAJA P.;FIROUZDOR, VAHID |
分类号 |
H01L21/265;H01L21/02 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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