| 摘要 |
Provided are a microwave heating apparatus and a microwave heating method which can perform a uniform and efficient heating to an object to be processed. The microwave heating apparatus (1) of the present invention comprises: a processing container (2), which comprises: a top wall (11); a floor wall (13); and, a side wall unit (12), for accommodating a wafer (W); a microwave introducing unit (3) for generating a microwave for heating the wafer (W) and introducing it from one or more microwave introducing port (10) formed on the top wall (11) to the processing container (2); and, a maintaining unit (15) for contacting the wafer (W) to maintain the wafer (W) in a position facing the top wall (11) in the processing container (2). The microwave heating apparatus (1) performs heating by maintaining the wafer (W) by the maintaining unit (15) at a first height position wherein, H1, which is the distance from the top surface of the floor wall (13) to the bottom surface of the wafer (W), satisfies H1<λ/2 for the λ, which is the wavelength of the microwave, and H2, which is the distance from the bottom surface of the top wall (11) to the top surface of the wafer (W), satisfies 3λ/4<=H2<λ for the λ which is the wavelength of the microwave. |
