发明名称 FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a field effect transistor having excellent withstand voltage performance and high frequency characteristics, by reducing gate current.SOLUTION: A gate electrode 9 embedded in recess structures 10, 11 has a cross sectional shape of an upside-down T shape, and a spatial distance between a channel and a side wall of the gate electrode 9 in the recess structures 10, 11 is made large. Thus, a reduction effect of gate parasitic capacitance and a reduction effect of gate leakage current can be obtained.</p>
申请公布号 JP2015188044(A) 申请公布日期 2015.10.29
申请号 JP20140065394 申请日期 2014.03.27
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 MATSUZAKI HIDEAKI
分类号 H01L21/338;H01L21/28;H01L21/336;H01L29/41;H01L29/423;H01L29/49;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
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